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タイトル: Amorphous-to-crystalline transition during the early stages of thin film growth of Cr on SiO2
著者: Hu, Minghui
Noda, Suguru
Hiroshi, Komiyama
著者(別言語): 野田, 優
小宮山, 宏
発行日: 2003年6月1日
出版者: American Institute of Physics
掲載誌情報: Journal of Applied Physics, 93 (11). pp. 9336-9344
抄録: The growth of sputter-deposited Cr thin films on amorphous SiO2 during the early stages was studied using transmission electron microscopy. Amorphous three-dimensional islands were first formed, and then they grew with continuously increasing density and slowly increasing size as the deposition proceeded. When these islands began to coalesce at a nominal film thickness of 2.3–3.0 nm, they abruptly crystallized into randomly oriented crystalline nuclei. The depth profile analysis by x-ray photoelectron spectroscopy indicates the existence of interfacial Cr–O interactions. After excluding the possibilities of kinetic limitation and interfacial mixing, a thermodynamic model was employed to explain the size-dependent amorphous-to-crystalline transition. Our results suggest that the interfacial-interaction-induced strain relaxation at island/substrate interfaces might result in the thermodynamic stabilization of substrate-supported amorphous islands below a critical size.
URI: http://hdl.handle.net/2261/15
ISSN: 00218979
出現カテゴリ:1133810 学術雑誌論文
014 自然科学


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