2024-03-28T23:57:14Z
https://repository.dl.itc.u-tokyo.ac.jp/oai
oai:repository.dl.itc.u-tokyo.ac.jp:00001419
2022-12-19T03:42:43Z
110:212:254
9:233:234
単結晶電界効果トランジスタの作製に向けたプロセスの最適化
Process optimization for the fabrication of oxide single crystal field effect transistors
西尾, 和記
2008-03-24
jpn
thesis
http://hdl.handle.net/2261/20236
https://repository.dl.itc.u-tokyo.ac.jp/records/1419
修士(科学)
2008-03-24
https://repository.dl.itc.u-tokyo.ac.jp/record/1419/files/K-2387.pdf
application/pdf
7.6 MB
2017-05-31
https://repository.dl.itc.u-tokyo.ac.jp/record/1419/files/K-01198-a.pdf
application/pdf
125.8 kB
2017-05-31