{"created":"2021-03-01T06:36:10.248036+00:00","id":18753,"links":{},"metadata":{"_buckets":{"deposit":"755a64a1-2387-41a2-b8b5-3b2e0e0cb1fa"},"_deposit":{"id":"18753","owners":[],"pid":{"revision_id":0,"type":"depid","value":"18753"},"status":"published"},"_oai":{"id":"oai:repository.dl.itc.u-tokyo.ac.jp:00018753","sets":["171:1108:1296:1297","9:504:1111:1298:1299"]},"item_4_alternative_title_1":{"attribute_name":"その他のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"Preparation of Ceramic Thin Films by Reactive Sputtering"}]},"item_4_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1993-12-01","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"12","bibliographicPageEnd":"835","bibliographicPageStart":"828","bibliographicVolumeNumber":"45","bibliographic_titles":[{"bibliographic_title":"生産研究"}]}]},"item_4_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"リアクティブスパッタリング法とは，スパッタリング中にターゲット元素と反応性ガスを反応させながら化合物薄膜を形成する方法である．当研究室では，この方法を用いて溶融法では作成不可能な組成系のガラス薄膜の合成を試みている．本稿では，リアクティブスパッタリング法によるセラミックス系材料の合成と，MoSi2ターゲットを用いて酸素雰囲気中でのリアクティブスパッタリング法によるMo-Si-O薄膜の合成と，スパッタリングにおける化合物ターゲットと金属ターゲットの関係について述べる．","subitem_description_type":"Abstract"}]},"item_4_description_6":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"小特集 先端素材開発研究センター","subitem_description_type":"Other"}]},"item_4_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"33205","nameIdentifierScheme":"WEKO"}],"names":[{"name":"UTSUNO, Futoshi"}]},{"nameIdentifiers":[{"nameIdentifier":"33206","nameIdentifierScheme":"WEKO"}],"names":[{"name":"YASUI, Itaru"}]}]},"item_4_publisher_20":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"東京大学生産技術研究所"}]},"item_4_source_id_10":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN00127075","subitem_source_identifier_type":"NCID"}]},"item_4_source_id_8":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0037105X","subitem_source_identifier_type":"ISSN"}]},"item_4_subject_15":{"attribute_name":"日本十進分類法","attribute_value_mlt":[{"subitem_subject":"549","subitem_subject_scheme":"NDC"}]},"item_4_text_21":{"attribute_name":"出版者別名","attribute_value_mlt":[{"subitem_text_value":"Institute of Industrial Science, the University of Tokyo"}]},"item_4_text_4":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_value":"東京大学生産技術研究所第4部 無機工業化学"},{"subitem_text_value":"東京大学生産技術研究所付属先端素材開発研究センター 先端素材設計"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"宇都野, 太"}],"nameIdentifiers":[{"nameIdentifier":"33203","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"安井, 至"}],"nameIdentifiers":[{"nameIdentifier":"33204","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-06-08"}],"displaytype":"detail","filename":"sk045012004.pdf","filesize":[{"value":"757.8 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"sk045012004.pdf","url":"https://repository.dl.itc.u-tokyo.ac.jp/record/18753/files/sk045012004.pdf"},"version_id":"a83cfb38-5c2f-4c8d-b814-464742d68c28"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"特集4 : 研究解説 : リアクティブスパッタリング法によるセラミックス系薄膜の合成","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"特集4 : 研究解説 : リアクティブスパッタリング法によるセラミックス系薄膜の合成"}]},"item_type_id":"4","owner":"1","path":["1297","1299"],"pubdate":{"attribute_name":"公開日","attribute_value":"2012-11-15"},"publish_date":"2012-11-15","publish_status":"0","recid":"18753","relation_version_is_last":true,"title":["特集4 : 研究解説 : リアクティブスパッタリング法によるセラミックス系薄膜の合成"],"weko_creator_id":"1","weko_shared_id":null},"updated":"2022-12-19T03:57:30.914581+00:00"}