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Synthesis of carbon films with applying negative DC bias voltages in surface wave excited plasma CVD apparatus
http://hdl.handle.net/2261/15290
http://hdl.handle.net/2261/15290f0bbf0ab-dcf0-4852-8e9c-efa3fbbbe1a0
名前 / ファイル | ライセンス | アクション |
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本文(fulltext) (3.1 MB)
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要旨(summary) (444.7 kB)
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Item type | 学位論文 / Thesis or Dissertation(1) | |||||
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公開日 | 2011-08-08 | |||||
タイトル | ||||||
タイトル | Synthesis of carbon films with applying negative DC bias voltages in surface wave excited plasma CVD apparatus | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_46ec | |||||
タイプ | thesis | |||||
その他のタイトル | ||||||
その他のタイトル | 表面波プロセスプラズマを用いた負の直流バイアス電圧印加によるカーボン系薄膜合成 | |||||
著者 |
金, 東珉
× 金, 東珉 |
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著者別名 | ||||||
識別子 | 4348 | |||||
識別子Scheme | WEKO | |||||
姓名 | キム, ドンミン | |||||
著者所属 | ||||||
著者所属 | 東京大学大学院新領域創成科学研究科 基盤科学研究系 先端エネルギー工学専攻 | |||||
書誌情報 | 発行日 2008-03-24 | |||||
日本十進分類法 | ||||||
主題 | 400 | |||||
主題Scheme | NDC | |||||
学位名 | ||||||
学位名 | 修士(科学) | |||||
学位 | ||||||
値 | master | |||||
研究科・専攻 | ||||||
新領域創成科学研究科先端エネルギー工学専攻 | ||||||
学位授与年月日 | ||||||
学位授与年月日 | 2008-03-24 | |||||
学位記番号 | ||||||
修創域第2414号 |