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Structure and morphology of self-assembled 3-mercaptopropyltrimethoxysilane layers on silicon oxide
http://hdl.handle.net/2261/22
http://hdl.handle.net/2261/22abb6dace-78b8-43eb-abf9-3e2a4427e09c
名前 / ファイル | ライセンス | アクション |
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2001ASS_hu.pdf (496.8 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2006-02-06 | |||||
タイトル | ||||||
タイトル | Structure and morphology of self-assembled 3-mercaptopropyltrimethoxysilane layers on silicon oxide | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
主題 | Silica | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | Silicon oxide | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | Self assembly | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | Morphology | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | Surface treatment | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | Silanes | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | Monolayers | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | Dehydration | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | Polymerization | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | Concentration | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | X ray photoelectron spectroscopy | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | Scanning electron microscopy | |||||
主題Scheme | Other | |||||
キーワード | ||||||
主題 | Atomic force microscopy | |||||
主題Scheme | Other | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
著者 |
Hu, Minghui
× Hu, Minghui× Noda, Suguru× Okubo, Tatsuya× Yamaguchi, Yukio× Komiyama, Hiroshi |
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著者別名 | ||||||
識別子 | 61 | |||||
識別子Scheme | WEKO | |||||
姓名 | 野田, 優 | |||||
著者別名 | ||||||
識別子 | 62 | |||||
識別子Scheme | WEKO | |||||
姓名 | 大久保, 達也 | |||||
著者別名 | ||||||
識別子 | 63 | |||||
識別子Scheme | WEKO | |||||
姓名 | 山口, 由岐夫 | |||||
著者別名 | ||||||
識別子 | 64 | |||||
識別子Scheme | WEKO | |||||
姓名 | 小宮山, 宏 | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Self-assembled 3-mercaptopropyltrimethoxysilane (MPTMS, (CH3O)3SiCH2CH2CH2 SH) layers on hydroxyl-terminated silicon oxide (SiO2) were prepared at MPTMS concentrations ranging from 5 × 10-3 to 4 × 10-2M. The surface structure and morphology of MPTMS layers were characterized by X-ray photoelectron spectroscopy (XPS), contact angle measurements, scanning electron microscopy (SEM), and atomic force microscopy (AFM). We found that the MPTMS layers on SiO2 consisted of dispersed domains 20-200nm in diameter, instead of continuous, flat monolayers. With increasing MPTMS concentration, the domain shape changed from flat to steep. Flat domains were composed of well-ordered monolayers with thiol headgroups uniformly distributed on the uppermost surface, whereas steep domains were composed of disordered polymers with randomly distributed thiol headgroups on the uppermost surface. These results indicate that MPTMS molecules show good self-assembly at an MPTMS concentration of 5 × 10-3M, but not above this concentration. The effect of MPTMS concentration on the structure and morphology of MPTMS layers might be due to the competition between self-polymerization and surface dehydration reactions, which depends on the trace quantity of water in the solvent and on the SiO2 surface. Our research further indicates that MPTMS and water concentrations are the controlling parameters for preparing well-ordered, self-assembled MPTMS monolayers on SiO2. | |||||
書誌情報 |
Applied surface science : a journal devoted to the properties of interfaces in relation to the synthesis and behaviour of materials 巻 181, 号 3-4, p. 307-316, 発行日 2001-09-21 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 01694332 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA10503400 | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
日本十進分類法 | ||||||
主題 | 431.1 | |||||
主題Scheme | NDC | |||||
出版者 | ||||||
出版者 | Elsevier |